Physical mechanism of aluminum contamination presented in H₂O₂ plasma sterilization

In this paper, it is first demonstrated that Aluminum (Al) contamination present; H2O2 plasma sterilization widely used for of surgical instruments. The amount Al can reach as high 7.9 × 1012 atoms/cm2. well known a harmful element to human health, which may damage bones and the brain. During use instruments after in surgery, contaminated enter reside body threaten health even life safety. Therefore, necessary study present arouse public attention take countermeasures. physical mechanism presented diffusion. our previous study, we developed two models calculating diffusion coefficient. both are calculate coefficient sterilized Si samples. From calculation results, inferred closer model, where value function treatment time.